Tribological characterization of Ti-Si-N nano films prepared by reactive magnetic sputtering

Xinping Niu, Xin Wang, Shengli Ma, Kewei Xu, Weimin Liu

科研成果: 期刊稿件文章同行评审

2 引用 (Scopus)

摘要

Ti-Si-N nano films were deposited on 1Crl8Ni9Ti stainless steel by reactive magnetic sputtering. The silicon contents in the films were varied in a range of 0-19.4at%. The results show that crystallite size decreases with the increase of silicon content, and the microhardness of Ti-Si-N film increase with an certain addition of silicon, the maximum hardness value of films is 43.5 GPa with 9.6at% silicon content in Ti-Si-N film. The bonding strength of Ti-Si-N is improved compared to TiN film. Furthermore, friction coefficient and wear rate of the Ti-Si-N films decrease firstly and then increase with addition of silicon. It shows a much lower friction coefficient at elevated temperature conditions, however the wear rate increase remarkably.

源语言英语
页(从-至)1882-1885
页数4
期刊Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
34
12
出版状态已出版 - 12月 2005
已对外发布

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