Abstract
Ti-Si-N nano films were deposited on 1Crl8Ni9Ti stainless steel by reactive magnetic sputtering. The silicon contents in the films were varied in a range of 0-19.4at%. The results show that crystallite size decreases with the increase of silicon content, and the microhardness of Ti-Si-N film increase with an certain addition of silicon, the maximum hardness value of films is 43.5 GPa with 9.6at% silicon content in Ti-Si-N film. The bonding strength of Ti-Si-N is improved compared to TiN film. Furthermore, friction coefficient and wear rate of the Ti-Si-N films decrease firstly and then increase with addition of silicon. It shows a much lower friction coefficient at elevated temperature conditions, however the wear rate increase remarkably.
| Original language | English |
|---|---|
| Pages (from-to) | 1882-1885 |
| Number of pages | 4 |
| Journal | Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering |
| Volume | 34 |
| Issue number | 12 |
| State | Published - Dec 2005 |
| Externally published | Yes |
Keywords
- Bonding strength
- Friction coefficient
- Microhardness
- Ti-Si-N nano films