Structural characterization of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition

Shengli Ma; Dayan Ma; Kewei Xu; Wanqi Jie

doi:10.1116/1.1763593

Structural characterization of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition

Shengli Ma, Dayan Ma, Kewei Xu, Wanqi Jie

材料学院

科研成果: 期刊稿件 › 文章 › 同行评审

12 引用（Scopus）

摘要

The properties of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition in an industrial chamber were studied. It was found that the microstructure of the coatings varies significantly with the processing parameters. It was also found that the nanocrystalline TiN and/or TiSi₂ particles are embedded into an amorphous matrix of Si ₃N₄. The silicon content in the Ti-Si-N coatings and the coating thickness and the crystallinity were also found to increase when the inlet gas ratio of X-[SiCl₄÷(TiCl₄+SiCl ₄)] increases.

源语言	英语
页（从-至）	1694-1698
页数	5
期刊	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
卷	22
期	4
DOI	https://doi.org/10.1116/1.1763593
出版状态	已出版 - 7月 2004

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abstract = "The properties of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition in an industrial chamber were studied. It was found that the microstructure of the coatings varies significantly with the processing parameters. It was also found that the nanocrystalline TiN and/or TiSi2 particles are embedded into an amorphous matrix of Si 3N4. The silicon content in the Ti-Si-N coatings and the coating thickness and the crystallinity were also found to increase when the inlet gas ratio of X-[SiCl4÷(TiCl4+SiCl 4)] increases.",

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AU - Ma, Dayan

AU - Xu, Kewei

AU - Jie, Wanqi

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N2 - The properties of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition in an industrial chamber were studied. It was found that the microstructure of the coatings varies significantly with the processing parameters. It was also found that the nanocrystalline TiN and/or TiSi2 particles are embedded into an amorphous matrix of Si 3N4. The silicon content in the Ti-Si-N coatings and the coating thickness and the crystallinity were also found to increase when the inlet gas ratio of X-[SiCl4÷(TiCl4+SiCl 4)] increases.

AB - The properties of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition in an industrial chamber were studied. It was found that the microstructure of the coatings varies significantly with the processing parameters. It was also found that the nanocrystalline TiN and/or TiSi2 particles are embedded into an amorphous matrix of Si 3N4. The silicon content in the Ti-Si-N coatings and the coating thickness and the crystallinity were also found to increase when the inlet gas ratio of X-[SiCl4÷(TiCl4+SiCl 4)] increases.

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Structural characterization of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition

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