Structural characterization of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition

Shengli Ma; Dayan Ma; Kewei Xu; Wanqi Jie

doi:10.1116/1.1763593

Structural characterization of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition

Shengli Ma, Dayan Ma, Kewei Xu, Wanqi Jie

School of Materials Sience and Engineering

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

The properties of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition in an industrial chamber were studied. It was found that the microstructure of the coatings varies significantly with the processing parameters. It was also found that the nanocrystalline TiN and/or TiSi₂ particles are embedded into an amorphous matrix of Si ₃N₄. The silicon content in the Ti-Si-N coatings and the coating thickness and the crystallinity were also found to increase when the inlet gas ratio of X-[SiCl₄÷(TiCl₄+SiCl ₄)] increases.

Original language	English
Pages (from-to)	1694-1698
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	22
Issue number	4
DOIs	https://doi.org/10.1116/1.1763593
State	Published - Jul 2004

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@article{ceb7bcea5daa4363ad1971a04a93a3d1,

title = "Structural characterization of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition",

abstract = "The properties of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition in an industrial chamber were studied. It was found that the microstructure of the coatings varies significantly with the processing parameters. It was also found that the nanocrystalline TiN and/or TiSi2 particles are embedded into an amorphous matrix of Si 3N4. The silicon content in the Ti-Si-N coatings and the coating thickness and the crystallinity were also found to increase when the inlet gas ratio of X-[SiCl4÷(TiCl4+SiCl 4)] increases.",

author = "Shengli Ma and Dayan Ma and Kewei Xu and Wanqi Jie",

year = "2004",

month = jul,

doi = "10.1116/1.1763593",

language = "英语",

volume = "22",

pages = "1694--1698",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "4",

}

TY - JOUR

T1 - Structural characterization of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition

AU - Ma, Shengli

AU - Ma, Dayan

AU - Xu, Kewei

AU - Jie, Wanqi

PY - 2004/7

Y1 - 2004/7

N2 - The properties of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition in an industrial chamber were studied. It was found that the microstructure of the coatings varies significantly with the processing parameters. It was also found that the nanocrystalline TiN and/or TiSi2 particles are embedded into an amorphous matrix of Si 3N4. The silicon content in the Ti-Si-N coatings and the coating thickness and the crystallinity were also found to increase when the inlet gas ratio of X-[SiCl4÷(TiCl4+SiCl 4)] increases.

AB - The properties of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition in an industrial chamber were studied. It was found that the microstructure of the coatings varies significantly with the processing parameters. It was also found that the nanocrystalline TiN and/or TiSi2 particles are embedded into an amorphous matrix of Si 3N4. The silicon content in the Ti-Si-N coatings and the coating thickness and the crystallinity were also found to increase when the inlet gas ratio of X-[SiCl4÷(TiCl4+SiCl 4)] increases.

UR - http://www.scopus.com/inward/record.url?scp=5044242553&partnerID=8YFLogxK

U2 - 10.1116/1.1763593

DO - 10.1116/1.1763593

M3 - 文章

AN - SCOPUS:5044242553

SN - 1071-1023

VL - 22

SP - 1694

EP - 1698

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 4

ER -

Structural characterization of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition

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