Numerical simulation of chemical vapor deposition process of SiC coating on special-shaped components

An integrated mathematical model depicting chemical vapor deposition(CVD)process of SiC coating on special-shaped components was developed. The model was proposed to simulate deposition behavior of SiC coating on typical special-shaped components. The calculated results indicate that the components with a slope have significant influence on the CVD process of SiC coating. Small angle between the slope and horizontal plant is beneficial to the quality control of CVD SiC. In terms of the components with step shape, it is suggested that the step part of a component should be placed along the downstream direction. The calculation results lay foundation on further research and optimization of CVD process of SiC coating.