Numerical simulation of chemical vapor deposition process of SiC coating on special-shaped components

Guo Dong Sun, He Jun Li, Qian Gang Fu, Hui Li

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

An integrated mathematical model depicting chemical vapor deposition(CVD)process of SiC coating on special-shaped components was developed. The model was proposed to simulate deposition behavior of SiC coating on typical special-shaped components. The calculated results indicate that the components with a slope have significant influence on the CVD process of SiC coating. Small angle between the slope and horizontal plant is beneficial to the quality control of CVD SiC. In terms of the components with step shape, it is suggested that the step part of a component should be placed along the downstream direction. The calculation results lay foundation on further research and optimization of CVD process of SiC coating.

Original languageEnglish
Pages (from-to)232-238
Number of pages7
JournalGuti Huojian Jishu/Journal of Solid Rocket Technology
Volume40
Issue number2
DOIs
StatePublished - 1 Apr 2017

Keywords

  • Chemical vapor deposition
  • Numerical simulation
  • SiC coating
  • Special-shaped components

Fingerprint

Dive into the research topics of 'Numerical simulation of chemical vapor deposition process of SiC coating on special-shaped components'. Together they form a unique fingerprint.

Cite this