摘要
The fabrication of positively patterned conducting polymer microstructures was discussed. The conducting polymer structures were fabricated by one-step electropolymerization. The atomic force microscopic (AFM) measurement of the octadecyltrichlorosilane patterned silicon substrate using stamp showed the light replication of the poly(dimethylsiloxane) stamp.
源语言 | 英语 |
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页(从-至) | 1367-1370 |
页数 | 4 |
期刊 | Advanced Materials |
卷 | 15 |
期 | 16 |
DOI | |
出版状态 | 已出版 - 15 8月 2003 |
已对外发布 | 是 |