Fabrication of Positively Patterned Conducting Polymer Microstructures via One-Step Electrodeposition

Feng Zhou; Miao Chen; Weimin Liu; Jianxi Liu; Zhilu Liu; Zonggang Mu

doi:10.1002/adma.200304466

Fabrication of Positively Patterned Conducting Polymer Microstructures via One-Step Electrodeposition

Feng Zhou, Miao Chen, Weimin Liu, Jianxi Liu, Zhilu Liu, Zonggang Mu

CAS - Lanzhou Institute of Chemical Physics

Research output: Contribution to journal › Article › peer-review

33 Scopus citations

Abstract

The fabrication of positively patterned conducting polymer microstructures was discussed. The conducting polymer structures were fabricated by one-step electropolymerization. The atomic force microscopic (AFM) measurement of the octadecyltrichlorosilane patterned silicon substrate using stamp showed the light replication of the poly(dimethylsiloxane) stamp.

Original language	English
Pages (from-to)	1367-1370
Number of pages	4
Journal	Advanced Materials
Volume	15
Issue number	16
DOIs	https://doi.org/10.1002/adma.200304466
State	Published - 15 Aug 2003
Externally published	Yes

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title = "Fabrication of Positively Patterned Conducting Polymer Microstructures via One-Step Electrodeposition",

abstract = "The fabrication of positively patterned conducting polymer microstructures was discussed. The conducting polymer structures were fabricated by one-step electropolymerization. The atomic force microscopic (AFM) measurement of the octadecyltrichlorosilane patterned silicon substrate using stamp showed the light replication of the poly(dimethylsiloxane) stamp.",

author = "Feng Zhou and Miao Chen and Weimin Liu and Jianxi Liu and Zhilu Liu and Zonggang Mu",

year = "2003",

month = aug,

day = "15",

doi = "10.1002/adma.200304466",

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volume = "15",

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journal = "Advanced Materials",

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AU - Zhou, Feng

AU - Chen, Miao

AU - Liu, Weimin

AU - Liu, Jianxi

AU - Liu, Zhilu

AU - Mu, Zonggang

PY - 2003/8/15

Y1 - 2003/8/15

N2 - The fabrication of positively patterned conducting polymer microstructures was discussed. The conducting polymer structures were fabricated by one-step electropolymerization. The atomic force microscopic (AFM) measurement of the octadecyltrichlorosilane patterned silicon substrate using stamp showed the light replication of the poly(dimethylsiloxane) stamp.

AB - The fabrication of positively patterned conducting polymer microstructures was discussed. The conducting polymer structures were fabricated by one-step electropolymerization. The atomic force microscopic (AFM) measurement of the octadecyltrichlorosilane patterned silicon substrate using stamp showed the light replication of the poly(dimethylsiloxane) stamp.

UR - http://www.scopus.com/inward/record.url?scp=0042281527&partnerID=8YFLogxK

U2 - 10.1002/adma.200304466

DO - 10.1002/adma.200304466

M3 - 文章

AN - SCOPUS:0042281527

SN - 0935-9648

VL - 15

SP - 1367

EP - 1370

JO - Advanced Materials

JF - Advanced Materials

IS - 16

ER -

Fabrication of Positively Patterned Conducting Polymer Microstructures via One-Step Electrodeposition

Abstract

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