Effect of C/B ratio in reactants on low-pressure CVD boron-doped carbon deposited from a BCl3-C3H6-H2 mixture

Yongsheng Liu, Litong Zhang, Laifei Cheng, Wenbin Yang, Yongdong Xu, Qingfeng Zeng

科研成果: 期刊稿件 › 文章 › 同行评审

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Engineering