Effect of deposition temperature on deposition kinetics and mechanism of silicon boron nitride coating deposited from SiCl4-BCl3-NH3-H2-Ar mixture using low pressure chemical vapor deposition

Yongsheng Liu, Nan Chai, Zan Li, Fang Ye, Xiaofei Liu, Laifei Cheng

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

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Chemical Engineering