Effect of deposition temperature on deposition kinetics and mechanism of silicon boron nitride coating deposited from SiCl4-BCl3-NH3-H2-Ar mixture using low pressure chemical vapor deposition

Yongsheng Liu; Nan Chai; Zan Li; Fang Ye; Xiaofei Liu; Laifei Cheng

doi:10.1016/j.surfcoat.2014.11.015

Effect of deposition temperature on deposition kinetics and mechanism of silicon boron nitride coating deposited from SiCl₄-BCl₃-NH₃-H₂-Ar mixture using low pressure chemical vapor deposition

Yongsheng Liu, Nan Chai, Zan Li, Fang Ye, Xiaofei Liu, Laifei Cheng

School of Materials Sience and Engineering

Northwestern Polytechnical University Xian

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

The effect of deposition temperature on deposition kinetics and mechanism of silicon boron nitride (SiBN) coating was investigated from SiCl₄-BCl₃-NH₃-H₂-Ar mixture using low pressure chemical vapor deposition (LPCVD). Results showed that the deposition rates increased from 700°C to 1030°C, and then decreased above 1030°C. The relative content of silicon increased with increasing deposition temperature. The SiBN coating was of amorphous phase and its surface morphology showed cauliflower-like. The bonding states of SiBN coating were the B-N and Si-N bonding at all deposition temperatures, which demonstrated that the SiBN coating is composed of very small Si-N and B-N particles and the main deposition mechanisms refer to two parallel reaction systems of BCl₃+NH₃ and SiCl₄+NH₃. The deposition reactions were mainly controlled by BCl₃+NH₃ under 900°C, and by SiCl₄+NH₃ over 900°C.

Original language	English
Pages (from-to)	295-303
Number of pages	9
Journal	Surface and Coatings Technology
Volume	261
DOIs	https://doi.org/10.1016/j.surfcoat.2014.11.015
State	Published - 15 Jan 2015

Keywords

Deposition kinetics
Deposition mechanism
Deposition temperature
LPCVD
SiBN coating

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10.1016/j.surfcoat.2014.11.015

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title = "Effect of deposition temperature on deposition kinetics and mechanism of silicon boron nitride coating deposited from SiCl4-BCl3-NH3-H2-Ar mixture using low pressure chemical vapor deposition",

abstract = "The effect of deposition temperature on deposition kinetics and mechanism of silicon boron nitride (SiBN) coating was investigated from SiCl4-BCl3-NH3-H2-Ar mixture using low pressure chemical vapor deposition (LPCVD). Results showed that the deposition rates increased from 700°C to 1030°C, and then decreased above 1030°C. The relative content of silicon increased with increasing deposition temperature. The SiBN coating was of amorphous phase and its surface morphology showed cauliflower-like. The bonding states of SiBN coating were the B-N and Si-N bonding at all deposition temperatures, which demonstrated that the SiBN coating is composed of very small Si-N and B-N particles and the main deposition mechanisms refer to two parallel reaction systems of BCl3+NH3 and SiCl4+NH3. The deposition reactions were mainly controlled by BCl3+NH3 under 900°C, and by SiCl4+NH3 over 900°C.",

keywords = "Deposition kinetics, Deposition mechanism, Deposition temperature, LPCVD, SiBN coating",

author = "Yongsheng Liu and Nan Chai and Zan Li and Fang Ye and Xiaofei Liu and Laifei Cheng",

note = "Publisher Copyright: {\textcopyright} 2014 Elsevier B.V.",

year = "2015",

month = jan,

day = "15",

doi = "10.1016/j.surfcoat.2014.11.015",

language = "英语",

volume = "261",

pages = "295--303",

journal = "Surface and Coatings Technology",

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publisher = "Elsevier B.V.",

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Effect of deposition temperature on deposition kinetics and mechanism of silicon boron nitride coating deposited from SiCl₄-BCl₃-NH₃-H₂-Ar mixture using low pressure chemical vapor deposition. / Liu, Yongsheng; Chai, Nan; Li, Zan et al.
In: Surface and Coatings Technology, Vol. 261, 15.01.2015, p. 295-303.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Effect of deposition temperature on deposition kinetics and mechanism of silicon boron nitride coating deposited from SiCl4-BCl3-NH3-H2-Ar mixture using low pressure chemical vapor deposition

AU - Liu, Yongsheng

AU - Chai, Nan

AU - Li, Zan

AU - Ye, Fang

AU - Liu, Xiaofei

AU - Cheng, Laifei

PY - 2015/1/15

Y1 - 2015/1/15

N2 - The effect of deposition temperature on deposition kinetics and mechanism of silicon boron nitride (SiBN) coating was investigated from SiCl4-BCl3-NH3-H2-Ar mixture using low pressure chemical vapor deposition (LPCVD). Results showed that the deposition rates increased from 700°C to 1030°C, and then decreased above 1030°C. The relative content of silicon increased with increasing deposition temperature. The SiBN coating was of amorphous phase and its surface morphology showed cauliflower-like. The bonding states of SiBN coating were the B-N and Si-N bonding at all deposition temperatures, which demonstrated that the SiBN coating is composed of very small Si-N and B-N particles and the main deposition mechanisms refer to two parallel reaction systems of BCl3+NH3 and SiCl4+NH3. The deposition reactions were mainly controlled by BCl3+NH3 under 900°C, and by SiCl4+NH3 over 900°C.

AB - The effect of deposition temperature on deposition kinetics and mechanism of silicon boron nitride (SiBN) coating was investigated from SiCl4-BCl3-NH3-H2-Ar mixture using low pressure chemical vapor deposition (LPCVD). Results showed that the deposition rates increased from 700°C to 1030°C, and then decreased above 1030°C. The relative content of silicon increased with increasing deposition temperature. The SiBN coating was of amorphous phase and its surface morphology showed cauliflower-like. The bonding states of SiBN coating were the B-N and Si-N bonding at all deposition temperatures, which demonstrated that the SiBN coating is composed of very small Si-N and B-N particles and the main deposition mechanisms refer to two parallel reaction systems of BCl3+NH3 and SiCl4+NH3. The deposition reactions were mainly controlled by BCl3+NH3 under 900°C, and by SiCl4+NH3 over 900°C.

KW - Deposition kinetics

KW - Deposition mechanism

KW - Deposition temperature

KW - LPCVD

KW - SiBN coating

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DO - 10.1016/j.surfcoat.2014.11.015

M3 - 文章

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SN - 0257-8972

VL - 261

SP - 295

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JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Effect of deposition temperature on deposition kinetics and mechanism of silicon boron nitride coating deposited from SiCl₄-BCl₃-NH₃-H₂-Ar mixture using low pressure chemical vapor deposition

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