摘要
The characteristics of Si micro-fabrication for MEMS by direct etching of KrF excimer laser, such as the machined topography, heat situation and thermal affecting zone are studied based on experiment. The duality empirical formula which can reflect the relationship between etching depth and number of pulses, laser energy is obtained and then analyzed.
源语言 | 英语 |
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页(从-至) | 107-110 |
页数 | 4 |
期刊 | Jixie Gongcheng Xuebao/Journal of Mechanical Engineering |
卷 | 36 |
期 | 3 |
DOI | |
出版状态 | 已出版 - 2000 |