INFLUENCE of SUBSTRATE TEMPERATURE on the COMPOSITION, ELECTRICAL RESISTIVITY and INFRARED EMISSIVITY of PtO x FILMS

Wenbo Kang, Dongmei Zhu, Xiaoke Lu, Zhibin Huang, Wancheng Zhou, Fa Luo

科研成果: 期刊稿件文章同行评审

摘要

PtOx films were deposited by direct current (DC) reactive magnetron sputtering in Ar/O2 mixture atmosphere at substrate temperatures ranging from 200°C to 400°C. The influence of substrate temperature on the structure, morphology, composition, electrical resistivity and infrared emissivity of PtOx films was studied. The X-ray photoelectron spectroscopy (XPS) and grazing incidence X-ray diffraction (GIXRD) results revealed that the as-deposited amorphous PtOx films were mainly composed of PtO and PtO2 phases. It was found that with the increase in the substrate temperature, the proportion of PtO phase in the films increased, while the electrical resistivity and infrared emissivity of the films decreased with the increasing substrate temperature.

源语言英语
文章编号1950056
期刊Surface Review and Letters
26
9
DOI
出版状态已出版 - 1 11月 2019

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