Annealing impact on Al/CdZnTe Schottky contact

Xu Xu Bai, Wan Qi Jie, Gang Qiang Zha, Tao Wang, Li Fu

科研成果: 期刊稿件文章同行评审

2 引用 (Scopus)

摘要

Au and Al electrodes were deposited by thermal evaporation onto CdZnTe surfaces, the effects of annealing conditions on the properties of Al/CdZnTe contact were studied. The sample was annealed at varies temperature in the region from 100°C to 300°C for 5 min under-N 2 ambience. Room temperature I-V and C-V characteristics of the sample annealed at different temperature were measured by Agilent 4155c Semiconductor Parameter Analyzer and Agilent 4294A impedance analyzer respectively. I-V and C-V curves shown that annealed at low temperature, the Schottky barrier height of Al/CdZnTe increases, ideal factor is close to 1, and the capacitance of the Schottky reduces for almost 50%. However, annealing at the temperature higher than 250°C, the Schottky barrier height decreases, meanwhile the ideal factor deviates from 1, and the capacitance of the Schottky is decreased for an order.

源语言英语
页(从-至)289-293
页数5
期刊Gongneng Cailiao yu Qijian Xuebao/Journal of Functional Materials and Devices
16
3
出版状态已出版 - 6月 2010

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