TY - JOUR
T1 - 原子层沉积技术选择性修饰Mo/HZSM-5对甲烷无氧芳构化反应的影响
AU - Chen, Chang Sheng
AU - Zhang, Bin
AU - Qin, Yong
N1 - Publisher Copyright:
© 2019, China National Chemical Information Center. All right reserved.
PY - 2019/12/20
Y1 - 2019/12/20
N2 - Atomic layer deposition (ALD) technique is used to deposit SiO2 selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO2-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH3-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO2 is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.
AB - Atomic layer deposition (ALD) technique is used to deposit SiO2 selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO2-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH3-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO2 is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.
KW - Atomic layer deposition
KW - Methane dehydroaromatization
KW - SiO
UR - http://www.scopus.com/inward/record.url?scp=85077093270&partnerID=8YFLogxK
U2 - 10.16606/j.cnki.issn0253-4320.2019.12.040
DO - 10.16606/j.cnki.issn0253-4320.2019.12.040
M3 - 文章
AN - SCOPUS:85077093270
SN - 0253-4320
VL - 39
SP - 191
EP - 195
JO - Xiandai Huagong/Modern Chemical Industry
JF - Xiandai Huagong/Modern Chemical Industry
IS - 12
ER -