原子层沉积技术选择性修饰Mo/HZSM-5对甲烷无氧芳构化反应的影响

Chang Sheng Chen, Bin Zhang, Yong Qin

科研成果: 期刊稿件文章同行评审

1 引用 (Scopus)

摘要

Atomic layer deposition (ALD) technique is used to deposit SiO2 selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO2-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH3-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO2 is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.

投稿的翻译标题Selective modification of Mo/HZSM-5 by atomic layer deposition and effects on methane dehydroaromatizatioin
源语言繁体中文
页(从-至)191-195
页数5
期刊Xiandai Huagong/Modern Chemical Industry
39
12
DOI
出版状态已出版 - 20 12月 2019
已对外发布

关键词

  • Atomic layer deposition
  • Methane dehydroaromatization
  • SiO

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