原子层沉积技术选择性修饰Mo/HZSM-5对甲烷无氧芳构化反应的影响

Chang Sheng Chen; Bin Zhang; Yong Qin

doi:10.16606/j.cnki.issn0253-4320.2019.12.040

原子层沉积技术选择性修饰Mo/HZSM-5对甲烷无氧芳构化反应的影响

Translated title of the contribution: Selective modification of Mo/HZSM-5 by atomic layer deposition and effects on methane dehydroaromatizatioin

Chang Sheng Chen, Bin Zhang, Yong Qin

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Atomic layer deposition (ALD) technique is used to deposit SiO₂ selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO₂-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH₃-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO₂ is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.

Translated title of the contribution	Selective modification of Mo/HZSM-5 by atomic layer deposition and effects on methane dehydroaromatizatioin
Original language	Chinese (Traditional)
Pages (from-to)	191-195
Number of pages	5
Journal	Xiandai Huagong/Modern Chemical Industry
Volume	39
Issue number	12
DOIs	https://doi.org/10.16606/j.cnki.issn0253-4320.2019.12.040
State	Published - 20 Dec 2019
Externally published	Yes

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title = "原子层沉积技术选择性修饰Mo/HZSM-5对甲烷无氧芳构化反应的影响",

abstract = "Atomic layer deposition (ALD) technique is used to deposit SiO2 selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO2-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH3-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO2 is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.",

keywords = "Atomic layer deposition, Methane dehydroaromatization, SiO",

author = "Chen, {Chang Sheng} and Bin Zhang and Yong Qin",

year = "2019",

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doi = "10.16606/j.cnki.issn0253-4320.2019.12.040",

language = "繁体中文",

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AU - Chen, Chang Sheng

AU - Zhang, Bin

AU - Qin, Yong

PY - 2019/12/20

Y1 - 2019/12/20

N2 - Atomic layer deposition (ALD) technique is used to deposit SiO2 selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO2-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH3-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO2 is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.

AB - Atomic layer deposition (ALD) technique is used to deposit SiO2 selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO2-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH3-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO2 is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.

KW - Atomic layer deposition

KW - Methane dehydroaromatization

KW - SiO

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M3 - 文章

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SN - 0253-4320

VL - 39

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JO - Xiandai Huagong/Modern Chemical Industry

JF - Xiandai Huagong/Modern Chemical Industry

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原子层沉积技术选择性修饰Mo/HZSM-5对甲烷无氧芳构化反应的影响

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