Chemical vapor deposition of boron-doped carbon coating from BCl 3-C3H6-H2-Ar gas mixture

Yongsheng Liu; Jia Jia Wan; Litong Zhang; Laifei Cheng

doi:10.1002/9781118932995.ch38

Chemical vapor deposition of boron-doped carbon coating from BCl ₃-C₃H₆-H₂-Ar gas mixture

Yongsheng Liu, Jia Jia Wan, Litong Zhang, Laifei Cheng

School of Materials Sience and Engineering

Northwestern Polytechnical University Xian

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Scopus citations

Abstract

Boron-doped carbon coating was deposited from BCl₃-C ₃H₆-H₂-Ar gas mixture by low pressure chemical vapor deposition. The morphologies, compositions and bonding states of deposits were analyzed using scanning electron microscope and X-ray photoelectron spectroscopy. The effects of deposition temperature, C/B ratio in reactants and Ar dilution flow on deposition rate, morphologies, compositions and bonding states were widely discussed. The deposition rate was mainly influenced by deposition temperature and C/B ratio in reactants. The cross-section morphologies changed from glass-like to nano-laminated structure with increasing temperature, C/B ratio and Ar dilution flow. The boron concentrations decreased with increasing temperature. C/B ratio and Ar dilution flow, corresponding with increased carbon concentrations.

Original language	English
Title of host publication	High Temperature Ceramic Matrix Composites 8 - A Collection of Papers Presented at the HTCMC 2013 Conference
Publisher	American Ceramic Society
Pages	357-370
Number of pages	14
ISBN (Print)	9781118932988
DOIs	https://doi.org/10.1002/9781118932995.ch38
State	Published - 2014
Event	8th High Temperature Ceramic Matrix Composites Conference, HTCMC 2013 - Xi'an, Shaanxi, China Duration: 22 Sep 2013 → 26 Sep 2013

Publication series

Name	Ceramic Transactions
Volume	248
ISSN (Print)	1042-1122

Conference

Conference	8th High Temperature Ceramic Matrix Composites Conference, HTCMC 2013
Country/Territory	China
City	Xi'an, Shaanxi
Period	22/09/13 → 26/09/13

Access to Document

10.1002/9781118932995.ch38

Cite this

Liu, Y., Wan, J. J., Zhang, L., & Cheng, L. (2014). Chemical vapor deposition of boron-doped carbon coating from BCl ₃-C₃H₆-H₂-Ar gas mixture. In High Temperature Ceramic Matrix Composites 8 - A Collection of Papers Presented at the HTCMC 2013 Conference (pp. 357-370). (Ceramic Transactions; Vol. 248). American Ceramic Society. https://doi.org/10.1002/9781118932995.ch38

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title = "Chemical vapor deposition of boron-doped carbon coating from BCl 3-C3H6-H2-Ar gas mixture",

abstract = "Boron-doped carbon coating was deposited from BCl3-C 3H6-H2-Ar gas mixture by low pressure chemical vapor deposition. The morphologies, compositions and bonding states of deposits were analyzed using scanning electron microscope and X-ray photoelectron spectroscopy. The effects of deposition temperature, C/B ratio in reactants and Ar dilution flow on deposition rate, morphologies, compositions and bonding states were widely discussed. The deposition rate was mainly influenced by deposition temperature and C/B ratio in reactants. The cross-section morphologies changed from glass-like to nano-laminated structure with increasing temperature, C/B ratio and Ar dilution flow. The boron concentrations decreased with increasing temperature. C/B ratio and Ar dilution flow, corresponding with increased carbon concentrations.",

author = "Yongsheng Liu and Wan, {Jia Jia} and Litong Zhang and Laifei Cheng",

year = "2014",

doi = "10.1002/9781118932995.ch38",

language = "英语",

isbn = "9781118932988",

series = "Ceramic Transactions",

publisher = "American Ceramic Society",

pages = "357--370",

booktitle = "High Temperature Ceramic Matrix Composites 8 - A Collection of Papers Presented at the HTCMC 2013 Conference",

note = "8th High Temperature Ceramic Matrix Composites Conference, HTCMC 2013 ; Conference date: 22-09-2013 Through 26-09-2013",

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Liu, Y, Wan, JJ, Zhang, L & Cheng, L 2014, Chemical vapor deposition of boron-doped carbon coating from BCl ₃-C₃H₆-H₂-Ar gas mixture. in High Temperature Ceramic Matrix Composites 8 - A Collection of Papers Presented at the HTCMC 2013 Conference. Ceramic Transactions, vol. 248, American Ceramic Society, pp. 357-370, 8th High Temperature Ceramic Matrix Composites Conference, HTCMC 2013, Xi'an, Shaanxi, China, 22/09/13. https://doi.org/10.1002/9781118932995.ch38

Chemical vapor deposition of boron-doped carbon coating from BCl ₃-C₃H₆-H₂-Ar gas mixture. / Liu, Yongsheng; Wan, Jia Jia; Zhang, Litong et al.
High Temperature Ceramic Matrix Composites 8 - A Collection of Papers Presented at the HTCMC 2013 Conference. American Ceramic Society, 2014. p. 357-370 (Ceramic Transactions; Vol. 248).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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T1 - Chemical vapor deposition of boron-doped carbon coating from BCl 3-C3H6-H2-Ar gas mixture

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N2 - Boron-doped carbon coating was deposited from BCl3-C 3H6-H2-Ar gas mixture by low pressure chemical vapor deposition. The morphologies, compositions and bonding states of deposits were analyzed using scanning electron microscope and X-ray photoelectron spectroscopy. The effects of deposition temperature, C/B ratio in reactants and Ar dilution flow on deposition rate, morphologies, compositions and bonding states were widely discussed. The deposition rate was mainly influenced by deposition temperature and C/B ratio in reactants. The cross-section morphologies changed from glass-like to nano-laminated structure with increasing temperature, C/B ratio and Ar dilution flow. The boron concentrations decreased with increasing temperature. C/B ratio and Ar dilution flow, corresponding with increased carbon concentrations.

AB - Boron-doped carbon coating was deposited from BCl3-C 3H6-H2-Ar gas mixture by low pressure chemical vapor deposition. The morphologies, compositions and bonding states of deposits were analyzed using scanning electron microscope and X-ray photoelectron spectroscopy. The effects of deposition temperature, C/B ratio in reactants and Ar dilution flow on deposition rate, morphologies, compositions and bonding states were widely discussed. The deposition rate was mainly influenced by deposition temperature and C/B ratio in reactants. The cross-section morphologies changed from glass-like to nano-laminated structure with increasing temperature, C/B ratio and Ar dilution flow. The boron concentrations decreased with increasing temperature. C/B ratio and Ar dilution flow, corresponding with increased carbon concentrations.

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