摘要
Cost-effective epitaxy of hillocks free CdZnTe films on (001)GaAs was explored with close-spaced sublimation (CSS) technique. The orientation and film quality were studied with scanning electron microscopy (SEM), X-ray diffraction θ-2θ and Φ scans and rocking, and cross-sectional transmission electron microscopy (TEM). It is found that higher deposition rate and better film quality can be achieved simultaneously at the elevated source and substrate temperatures. The full width half maximum (FWHM) of the X-ray rocking curve for (004) plane of the best CdZnTe film obtained so far is 306 arcsec, which was deposited at a rate of 1 μm/min under 100 Pa of Ar. The hillocks are believed to be prevented due to the prevention of the formation and propagation of long stacking faults.
源语言 | 英语 |
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页(从-至) | 39-41 |
页数 | 3 |
期刊 | Materials Letters |
卷 | 78 |
DOI | |
出版状态 | 已出版 - 1 7月 2012 |