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Multivariable immune predictive R2R control method for CMP process
Liang Wang
, Jingtao Hu
CAS - Shenyang Institute of Automation
University of Chinese Academy of Sciences
Shenyang Institute of Chemical Technology
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Engineering
Polishing Process
100%
Chemical Mechanical Polishing
100%
Material Removal Rate
50%
Least Square
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Support Vector Machine
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Simulation Result
25%
Illustrates
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Multi-Input Multi-Output
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Control Law
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Multiobjective Optimization Problem
25%
Product Quality
25%
Optimal Control
25%
Prediction Error
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Double Exponential
25%
Process Disturbance
25%
Moving Average
25%
Multivariable Controller
25%
Chemical Engineering
Support Vector Machine
100%