TY - JOUR
T1 - Molybdenum deposition on the thin alumina film
T2 - A combinatorial investigation by HREELS, XPS and UPS
AU - Jiang, Zhiquan
AU - Huang, Weixin
AU - Zhang, Zhen
AU - Zhao, Hong
AU - Tan, Dali
AU - Bao, Xinhe
PY - 2007/5/11
Y1 - 2007/5/11
N2 - Molybdenum deposition on the thin alumina film was investigated by HREELS, XPS and UPS. HREELS and XPS results show that a strong interaction occurs between the molybdenum and the oxide, and the electron transfers from the metallic nanoparticles to the underlying substrate. UPS measurements demonstrate that the Mo 4d valence band edge of the metallic nanoparticles locates at 1.36 eV, far below the Fermi level of the bulk molybdenum. This unique electronic structure of the metallic nanoparticles may provide a totally different property from the corresponding bulk materials, indicating a significant nanometer size effect.
AB - Molybdenum deposition on the thin alumina film was investigated by HREELS, XPS and UPS. HREELS and XPS results show that a strong interaction occurs between the molybdenum and the oxide, and the electron transfers from the metallic nanoparticles to the underlying substrate. UPS measurements demonstrate that the Mo 4d valence band edge of the metallic nanoparticles locates at 1.36 eV, far below the Fermi level of the bulk molybdenum. This unique electronic structure of the metallic nanoparticles may provide a totally different property from the corresponding bulk materials, indicating a significant nanometer size effect.
UR - http://www.scopus.com/inward/record.url?scp=34247356918&partnerID=8YFLogxK
U2 - 10.1016/j.cplett.2007.03.078
DO - 10.1016/j.cplett.2007.03.078
M3 - 文章
AN - SCOPUS:34247356918
SN - 0009-2614
VL - 439
SP - 313
EP - 317
JO - Chemical Physics Letters
JF - Chemical Physics Letters
IS - 4-6
ER -