Influence of the incident flux angles on the structures and properties of magnetron sputtered MoS2 films

Li Qiao, Peng Wang, Liqiang Chai, Xiaolong Zhang, Weimin Liu

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15 引用 (Scopus)

摘要

In this study, by adjusting the angle between the incident flux and the normal direction of the substrate's surface, the MoS2 film prepared by magnetron sputtering was used as a model system to study the influence of incident flux angles on the structures and properties of deposited films. The morphological and structural evolutions of MoS2 films deposited at different angles ranging from 0 to 85 degrees were characterized and the corresponding mechanical and tribological properties were evaluated. The results show that a conversion of a continuous film structure to a separate columnar structure with high porosity is found as the incident flux angle increases. Although changing the incident flux angle plays a negligible effect on the crystal preferential orientation of deposited MoS2 films, the mechanical and tribological properties of these films degrade dramatically when the incident flux angle is larger than 60 degrees.

源语言英语
文章编号175304
期刊Journal of Physics D: Applied Physics
48
17
DOI
出版状态已出版 - 8 5月 2015
已对外发布

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