@inproceedings{0b5628b1712e4cf9b48af06537181c61,
title = "Gradient lithography using graded tip array",
abstract = "Large-area patterned surfaces with chemical and/or morphological gradients have significant applications in biology, chemistry and materials science. In this work, a new strategy is developed to create the polydimethylsiloxane (PDMS) tip array with graded apex size, which is employed to fabricate gradient patterns with the lateral feature sizes changing from sub-100 nm to several microns on one single substrate over macroscopic (cm2) areas. The gradient structures can be produced in both near-field photolithography and soft contact printing. The formation of gradient feature size is ascribed to gradient contact areas between tips and substrates. This lithography strategy combines the advantages of a wide range of feature sizes, simplicity, high-throughput, low-cost and diversified feature shapes, making it a facile and flexible approach to manufacture various functional gradient structures.",
keywords = "contact printing, graded, Gradient patterns, PDMS tip array, photolithography, soft lithography",
author = "Jin Wu and Kai Tao and Jianmin Miao",
note = "Publisher Copyright: {\textcopyright} 2017 IEEE.; 19th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2017 ; Conference date: 18-06-2017 Through 22-06-2017",
year = "2017",
month = jul,
day = "26",
doi = "10.1109/TRANSDUCERS.2017.7994297",
language = "英语",
series = "TRANSDUCERS 2017 - 19th International Conference on Solid-State Sensors, Actuators and Microsystems",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "1312--1315",
booktitle = "TRANSDUCERS 2017 - 19th International Conference on Solid-State Sensors, Actuators and Microsystems",
}