Finite element simulation of the effects of process parameters on deposition uniformity of chemical-vapor-deposited silicon carbide

Guodong Sun, Hejun Li, Qiangang Fu, Min Huang, Wei Cao, Heng Wu

科研成果: 期刊稿件文章同行评审

7 引用 (Scopus)

指纹

探究 'Finite element simulation of the effects of process parameters on deposition uniformity of chemical-vapor-deposited silicon carbide' 的科研主题。它们共同构成独一无二的指纹。

Engineering

Chemical Engineering