Finite element simulation of effects of process parameters on deposition rate of SiC by chemical vapor deposition
Guodong Sun, Hejun Li, Shouyang Zhang, Qiangang Fu, Wei Cao, Yanqiong Jiao
科研成果: 书/报告/会议事项章节 › 会议稿件 › 同行评审
Guodong Sun, Hejun Li, Shouyang Zhang, Qiangang Fu, Wei Cao, Yanqiong Jiao
科研成果: 书/报告/会议事项章节 › 会议稿件 › 同行评审