Finite element simulation of effects of process parameters on deposition rate of SiC by chemical vapor deposition

Guodong Sun, Hejun Li, Shouyang Zhang, Qiangang Fu, Wei Cao, Yanqiong Jiao

科研成果: 书/报告/会议事项章节 › 会议稿件 › 同行评审

3 引用 （Scopus）

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Engineering

Chemical Engineering