Entropy engineering enabled atomically dispersed Cu doping leading to an exceptionally high thermoelectric figure of merit in n-type lead chalcogenides
Ziling Yuan, Mengyue Wu, Shuai Han, Pengfei Liu, Zhenhua Ge, Bangzhi Ge, Menghua Zhu, Yadong Xu, Wanqi Jie, Dongyao Zhao, Bingchao Yang, Yongsheng Zhang, Ming Liu, Min Zhu, Chao Li, Yuan Yu, Chongjian Zhou
- Northwestern Polytechnical University Xian
- CAS - Institute of High Energy Physics
- Spallation Neutron Source Science Center
- Kunming University of Science and Technology
- Qufu Normal University
- RWTH Aachen University
- CAS - Shanghai Institute of Microsystem and Information Technology
- Ministry of Industry and Information Technology
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