CVD Al2O3-SiO2 compound and the mechanism investigation

Zhaofeng Chen, Litong Zhang, Laifei Cheng, Yongdong Xu, Zhihao Jin

科研成果: 期刊稿件文章同行评审

摘要

The composition and microstructures of the Al2O3-SiO2: system coatings fabricated by chemical vapor deposition using AlCl3-SiCl4-H2-CO2: were investigated. The results show that completely compositional homogenization between silica and alumina does not occur under CVD conditions. The products deposited all were the transition Al2O3 attached amorphous SiO2. The size of the Al2O3-SiO2 particles declined with CVD temperature increasing in the range of 550°C-850°C. Dense and crystalline Al2O3·SiO2- α- Al2O3-ι- Al2O3-SiO2 coating was obtained by CVD at 1050°C.

源语言英语
页(从-至)609-611
页数3
期刊Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
33
6
出版状态已出版 - 6月 2004

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