Thermodynamic calculations on the chemical vapor deposition of Si-C-N from the SiCl4-NH3-C3H6-H2-Ar system

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Fingerprint

Dive into the research topics of 'Thermodynamic calculations on the chemical vapor deposition of Si-C-N from the SiCl4-NH3-C3H6-H2-Ar system'. Together they form a unique fingerprint.

Material Science

Chemical Engineering

Engineering