The effects of applied bias voltage on structure and hydrogen content of a-C:H films

Niankan Xu, Dachuan Yin, Zhengtang Liu, Xiulin Zheng

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Abstract

a-C:H films were prepared by the DC-RF PECVD technique. The variation of the structure and hydrogen content of the films versus the applied DC bias voltage were studied by FTIR and Raman scattering spectroscopy. The results showed that the structure of the films tended to be more graphite-like when at either a higher or a lower applied DC bias than at -800 V. The hydrogen content (total amount of both bonded and unbonded) of the films was found to have a maximum value at about -800 V. The results are discussed and compared with those reported in the published literature.

Original languageEnglish
Pages (from-to)763-768
Number of pages6
JournalJournal of Physics D: Applied Physics
Volume30
Issue number5
DOIs
StatePublished - 7 Mar 1997

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