TY - GEN
T1 - Sub-wavelength optical lithography via nanoscale polymer lens array
AU - Wu, Jin
AU - Tao, Kai
AU - Chen, Di
AU - Miao, Jianmin
N1 - Publisher Copyright:
© 2017 IEEE.
PY - 2017/2/23
Y1 - 2017/2/23
N2 - For the first time, under exposure is employed to fabricate the patterned photoresist templates with hemispherical cross-sectional profile. The long-range highly regular polymer lens array is replicated from the photoresist templates. The polymer lens array is utilized as the soft phase shift element to produce nearly perfectly periodic nanostructures with sub-100 nm feature size across centimeter-scale areas for the first time. The light focusing capabilities of the nanoscale polymer lens are verified by both simulation and experiment. The polymer lens arrays are repeated used for many times without obvious deterioration of their structures. By adjusting the size of polymer lens and the exposure dose, the metal and negative photoresist nanostructures with the smallest feature sizes of 80 and 200 nm are generated respectively. The advantages of this nanopatterning route lie in low-cost, high yield, long-range periodicity, programmable feature size, geometry and composition.
AB - For the first time, under exposure is employed to fabricate the patterned photoresist templates with hemispherical cross-sectional profile. The long-range highly regular polymer lens array is replicated from the photoresist templates. The polymer lens array is utilized as the soft phase shift element to produce nearly perfectly periodic nanostructures with sub-100 nm feature size across centimeter-scale areas for the first time. The light focusing capabilities of the nanoscale polymer lens are verified by both simulation and experiment. The polymer lens arrays are repeated used for many times without obvious deterioration of their structures. By adjusting the size of polymer lens and the exposure dose, the metal and negative photoresist nanostructures with the smallest feature sizes of 80 and 200 nm are generated respectively. The advantages of this nanopatterning route lie in low-cost, high yield, long-range periodicity, programmable feature size, geometry and composition.
UR - http://www.scopus.com/inward/record.url?scp=85015727094&partnerID=8YFLogxK
U2 - 10.1109/MEMSYS.2017.7863398
DO - 10.1109/MEMSYS.2017.7863398
M3 - 会议稿件
AN - SCOPUS:85015727094
T3 - Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
SP - 289
EP - 292
BT - 2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 30th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2017
Y2 - 22 January 2017 through 26 January 2017
ER -