Abstract
A SiC-glass interlayer was prepared as a diffusion barrier to suppress inter-diffusion between MoSi2 coating and an Nb-Si based alloy, and its oxidation behavior at 1250 ℃ and 1400 ℃ was investigated. The results revealed that the SiC-glass diffusion barrier effectively inhibited the inter-diffusion between silicide coating and substrate, and the IDZ thickness is 47% lower than that of the coating without diffusion barrier after oxidation at 1250 ℃ for 500 h. At 1400 °C, the SiC-glass diffusion barrier also can maintain a good stability and retard the inter-diffusion of elements between the coating and substrate effectively.
Original language | English |
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Article number | 110678 |
Journal | Corrosion Science |
Volume | 208 |
DOIs | |
State | Published - Nov 2022 |
Keywords
- Diffusion barrier
- MoSi coating
- Nb-Si based alloy
- Oxidation
- SiC-glass