Formation mechanism of robust silver nanoparticle film with superhydrophobicity

Zhiguang Guo, Weimin Liu

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

The promising formation mechanism of Ag nanoparticles on a Si wafer displaying superhydrophobicity, generated by means of a facile in situ galvanic cell route, is discussed. The results showed that the promising formation of Ag nanoparticles is based on a microelectrochemical redox reaction in which both the anodic process and the cathodic process occur simultaneously on the silicon substrate surface. This discovery could be of great importance in the design of other metal/semiconductor systems.

Original languageEnglish
Article number243701
JournalApplied Physics Letters
Volume97
Issue number24
DOIs
StatePublished - 13 Dec 2010
Externally publishedYes

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