Electronic structure and optical properties of monoclinic HfO2 with oxygen vacancy

Gangqiang Zha, Sanqi Tang, Tingting Tan

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

The electronic structure and optical properties of monoclinic HfO2 (m-HfO2) with the consideration of oxygen vacancy were calculated using the plane-wave ultrasoft pseudopotential method based on the first-principles density functional theory (DFT). The results reveal that a new defect level at the conduction band edge is introduced for the defective m-HfO2, and the 5d states of Hf atoms nearest to the oxygen vacancy make significant contribution to it. Furthermore, the dielectric functions and absorption coefficients of the perfect and defective m-HfO2 were calculated and analyzed by means of the electronic structures, which were related to the defect levels. The calculated absorption coefficient shows that m-HfO2 with oxygen vacancy exhibits an absorption band in the ultraviolet region.

Original languageEnglish
Pages (from-to)1576-1580
Number of pages5
JournalXiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
Volume42
Issue number8
StatePublished - Aug 2013

Keywords

  • Electronic structure
  • Monoclinic HfO
  • Optical property
  • Oxygen vacancy

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