Abstract
The electronic structure and optical properties of monoclinic HfO2 (m-HfO2) with the consideration of oxygen vacancy were calculated using the plane-wave ultrasoft pseudopotential method based on the first-principles density functional theory (DFT). The results reveal that a new defect level at the conduction band edge is introduced for the defective m-HfO2, and the 5d states of Hf atoms nearest to the oxygen vacancy make significant contribution to it. Furthermore, the dielectric functions and absorption coefficients of the perfect and defective m-HfO2 were calculated and analyzed by means of the electronic structures, which were related to the defect levels. The calculated absorption coefficient shows that m-HfO2 with oxygen vacancy exhibits an absorption band in the ultraviolet region.
Original language | English |
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Pages (from-to) | 1576-1580 |
Number of pages | 5 |
Journal | Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering |
Volume | 42 |
Issue number | 8 |
State | Published - Aug 2013 |
Keywords
- Electronic structure
- Monoclinic HfO
- Optical property
- Oxygen vacancy