Effect of deposition position on microstructure of HfC coating

Yong Jie Wang, He Jun Li, Qian Gang Fu, Hai Liang Li, Can Sun

Research output: Contribution to journalArticlepeer-review

Abstract

In order to research the effect of deposition position on HfC coating, the coating was prepared on the surface of C/C composites by LPCVD (low pressure chemical vapor deposition), using HfCl4-C3H6-H2 reaction system. The phase composition, grown orientation, surface morphology and the deposition rate were analyzed by X-ray diffractometer and scanning electron microscope. Results show that a flat and compact HfC coating with no carbon phase was obtained at 20~25 cm above the gas inlet. As the deposition position became far away from gas inlet, the coating deposition rate tends to decrease due to the reduction of reactants concentration. Moreover, the grain size is also reduced obviously, and the coating behaves preferred orientation growth following (200) plane.

Original languageEnglish
Pages (from-to)394-397
Number of pages4
JournalGuti Huojian Jishu/Journal of Solid Rocket Technology
Volume36
Issue number3
DOIs
StatePublished - Jun 2013

Keywords

  • Chemical vapor deposition
  • Deposition position
  • HfC coating

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