Deposition of high quality TiN thin films with nano-structure

Engineering

• Arc Plasma 33%
• Atomic Force Microscopy 33%
• Average Grain Size 33%
• Chemical Vapor Deposition 33%
• Dense Phase 33%
• Droplet Phase 33%
• Nanomaterial 100%
• Physical Vapor Deposition 33%
• Preferred Orientation 33%
• Room Temperature 33%
• Silicon Wafer 33%
• Stainless Steel 33%
• Thin Films 100%

Material Science

• Atomic Force Microscopy 25%
• Cathode 25%
• Chemical Vapor Deposition 25%
• Film 100%
• Grain Size 25%
• Nanostructure 100%
• Physical Vapor Deposition 25%
• Silicon Wafer 25%
• Stainless Steel 25%
• Thin Films 100%