Thermal decomposition of Mo(CO)6 on thin Al2O3 film: A combinatorial investigation by XPS and UPS

Zhiquan Jiang; Weixin Huang; Zhen Zhang; Hong Zhao; Dali Tan; Xinhe Bao

doi:10.1016/j.susc.2006.11.016

Thermal decomposition of Mo(CO)₆ on thin Al₂O₃ film: A combinatorial investigation by XPS and UPS

Zhiquan Jiang, Weixin Huang, Zhen Zhang, Hong Zhao, Dali Tan, Xinhe Bao

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19 引用（Scopus）

摘要

A thin and homogeneous alumina film was prepared by deposition and oxidation of aluminum on a refractory Re(0 0 0 1) substrate under ultrahigh vacuum conditions. X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS) and high-resolution electron-energy-loss spectroscopy (HREELS) demonstrate that the oxide film is long-range ordered, essentially stoichiometric and free from surface hydroxyl groups. The chemisorption and thermal decomposition of Mo(CO)₆ on the Al₂O₃ film were investigated by means of XPS and UPS. Mo(CO)₆ adsorbs molecularly on the oxide film at 100 K; however, thermal decomposition of the adsorbate occurs upon annealing at high temperatures. Consequently the metallic molybdenum clusters are deposited on the thin alumina film via complete decarbonylation of Mo(CO)₆.

源语言	英语
页（从-至）	844-851
页数	8
期刊	Surface Science
卷	601
期	3
DOI	https://doi.org/10.1016/j.susc.2006.11.016
出版状态	已出版 - 1 2月 2007
已对外发布	是

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@article{f48e46cf8520480fafca2db8dc98697d,

title = "Thermal decomposition of Mo(CO)6 on thin Al2O3 film: A combinatorial investigation by XPS and UPS",

abstract = "A thin and homogeneous alumina film was prepared by deposition and oxidation of aluminum on a refractory Re(0 0 0 1) substrate under ultrahigh vacuum conditions. X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS) and high-resolution electron-energy-loss spectroscopy (HREELS) demonstrate that the oxide film is long-range ordered, essentially stoichiometric and free from surface hydroxyl groups. The chemisorption and thermal decomposition of Mo(CO)6 on the Al2O3 film were investigated by means of XPS and UPS. Mo(CO)6 adsorbs molecularly on the oxide film at 100 K; however, thermal decomposition of the adsorbate occurs upon annealing at high temperatures. Consequently the metallic molybdenum clusters are deposited on the thin alumina film via complete decarbonylation of Mo(CO)6.",

keywords = "Molybdenum hexacarbonyl, Thermal decomposition, Thin AlO film, Ultraviolet photoelectron spectroscopy, X-ray photoelectron spectroscopy",

author = "Zhiquan Jiang and Weixin Huang and Zhen Zhang and Hong Zhao and Dali Tan and Xinhe Bao",

year = "2007",

month = feb,

day = "1",

doi = "10.1016/j.susc.2006.11.016",

language = "英语",

volume = "601",

pages = "844--851",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier B.V.",

number = "3",

}

TY - JOUR

T1 - Thermal decomposition of Mo(CO)6 on thin Al2O3 film

T2 - A combinatorial investigation by XPS and UPS

AU - Jiang, Zhiquan

AU - Huang, Weixin

AU - Zhang, Zhen

AU - Zhao, Hong

AU - Tan, Dali

AU - Bao, Xinhe

PY - 2007/2/1

Y1 - 2007/2/1

N2 - A thin and homogeneous alumina film was prepared by deposition and oxidation of aluminum on a refractory Re(0 0 0 1) substrate under ultrahigh vacuum conditions. X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS) and high-resolution electron-energy-loss spectroscopy (HREELS) demonstrate that the oxide film is long-range ordered, essentially stoichiometric and free from surface hydroxyl groups. The chemisorption and thermal decomposition of Mo(CO)6 on the Al2O3 film were investigated by means of XPS and UPS. Mo(CO)6 adsorbs molecularly on the oxide film at 100 K; however, thermal decomposition of the adsorbate occurs upon annealing at high temperatures. Consequently the metallic molybdenum clusters are deposited on the thin alumina film via complete decarbonylation of Mo(CO)6.

AB - A thin and homogeneous alumina film was prepared by deposition and oxidation of aluminum on a refractory Re(0 0 0 1) substrate under ultrahigh vacuum conditions. X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS) and high-resolution electron-energy-loss spectroscopy (HREELS) demonstrate that the oxide film is long-range ordered, essentially stoichiometric and free from surface hydroxyl groups. The chemisorption and thermal decomposition of Mo(CO)6 on the Al2O3 film were investigated by means of XPS and UPS. Mo(CO)6 adsorbs molecularly on the oxide film at 100 K; however, thermal decomposition of the adsorbate occurs upon annealing at high temperatures. Consequently the metallic molybdenum clusters are deposited on the thin alumina film via complete decarbonylation of Mo(CO)6.

KW - Molybdenum hexacarbonyl

KW - Thermal decomposition

KW - Thin AlO film

KW - Ultraviolet photoelectron spectroscopy

KW - X-ray photoelectron spectroscopy

UR - http://www.scopus.com/inward/record.url?scp=33846385963&partnerID=8YFLogxK

U2 - 10.1016/j.susc.2006.11.016

DO - 10.1016/j.susc.2006.11.016

M3 - 文章

AN - SCOPUS:33846385963

SN - 0039-6028

VL - 601

SP - 844

EP - 851

JO - Surface Science

JF - Surface Science

IS - 3

ER -

Thermal decomposition of Mo(CO)6 on thin Al2O3 film: A combinatorial investigation by XPS and UPS

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Thermal decomposition of Mo(CO)₆ on thin Al₂O₃ film: A combinatorial investigation by XPS and UPS