TY - JOUR
T1 - The influence of Ca doping in Bi2O2Se
T2 - A first-principles investigation
AU - Zhang, Xuyang
AU - Han, Nannan
AU - Lin, Changqing
AU - Wei, Qilin
AU - Zhao, Puqin
AU - Cheng, Yingchun
AU - Huang, Wei
N1 - Publisher Copyright:
© 2020 Elsevier B.V.
PY - 2020/6/15
Y1 - 2020/6/15
N2 - Bi2O2Se, as a member of bismuth oxychalcogenides, is regarded as a promising candidate for optoelectronic applications, such as phototransistors, photodetectors, pulsed lasers and photodiodes. Throughout the research progress of Bi2O2Se, the crystal quality of Bi2O2Se plays an important role. Using the first-principles calculations, we study the influence of Ca, one of the most abundant elements on the earth, doping in Bi2O2Se. We find that Ca doping is easy in Bi2O2Se which further induces substitution point defect CaBi. The presence of CaBi introduces a deep donor level which is favorable for a short carrier lifetime. Thus, Ca doping may be used to improve switching characteristics of Bi2O2Se-based diodes and transistors.
AB - Bi2O2Se, as a member of bismuth oxychalcogenides, is regarded as a promising candidate for optoelectronic applications, such as phototransistors, photodetectors, pulsed lasers and photodiodes. Throughout the research progress of Bi2O2Se, the crystal quality of Bi2O2Se plays an important role. Using the first-principles calculations, we study the influence of Ca, one of the most abundant elements on the earth, doping in Bi2O2Se. We find that Ca doping is easy in Bi2O2Se which further induces substitution point defect CaBi. The presence of CaBi introduces a deep donor level which is favorable for a short carrier lifetime. Thus, Ca doping may be used to improve switching characteristics of Bi2O2Se-based diodes and transistors.
KW - Bismuth oxychalcogenides
KW - Doping
KW - First-principles calculation
KW - Point defects
UR - http://www.scopus.com/inward/record.url?scp=85081904687&partnerID=8YFLogxK
U2 - 10.1016/j.commatsci.2020.109684
DO - 10.1016/j.commatsci.2020.109684
M3 - 文章
AN - SCOPUS:85081904687
SN - 0927-0256
VL - 179
JO - Computational Materials Science
JF - Computational Materials Science
M1 - 109684
ER -