Review on fabrication methods of SrTiO₃-based two dimensional conductive interfaces

The SrTiO3-based two dimensional conductive interfaces have attracted considerable attention in the last decade owing to the emergence of novel physical phenomena. These heterointerfaces are generally formed by depositing the films on SrTiO3 substrates. Particularly, the controllable and precise characteristics of pulsed laser deposition (PLD) allow the deposition of an atomically flat oxide films and control the growth layer-by-layer. Recently, the deposition methods of atomic layer deposition (ALD) and spin coating have exhibited an excellent practicability and many interesting results are obtained by analyzing the chemical reaction pathway. In addition, the surface treatment methods (such as high vacuum annealing, Ar+ ion irradiation and photoirradiation etc.) can also obtain the two dimensional conductive SrTiO3 effectively. Furthermore, owing to the difference of fabrication method, the SrTiO3-based two dimensional conductive interfaces significantly show different performances of the same oxides. Thus, this review compares the characteristics of different methods in preparing the SrTiO3-based interfaces. The appropriate method and process is the precondition to obtain high-quality oxide films and establish the foundation for the development of oxide and interface electronics.