Process of continuous membrane micro-deformable mirror based on SOI wafer

Dayong Qiao, Weizheng Yuan, Li Tian

科研成果: 期刊稿件文章同行评审

摘要

Silicon on insulator (SOI) provides a three-layer structure of Si/SiO2/Si, and makes it possible to achieve continuous membrane micro-deformable mirror based on deep reactive ion etching (DRIE). By using the SiO2 as the self-stop layer of dry etching, a single crystal silicon reflective mirror membrane can be readily realized with uniform and precisely controlled thickness. A process based on DRIE and anodic bonding of SOI wafer/Pyrex 7740 glass was presented, and a micro-deformable mirror with 69 actuators was fabricated and tested. The micro-deformable mirror, with an aperture of 10 mm, exhibits a working range of 4.25 μm, a PV flatness of 1.2 μm and a RMS roughness of 193 nm.

源语言英语
页(从-至)78-82
页数5
期刊Zhongguo Jiguang/Chinese Journal of Lasers
36
SUPPL. 2
DOI
出版状态已出版 - 12月 2009

指纹

探究 'Process of continuous membrane micro-deformable mirror based on SOI wafer' 的科研主题。它们共同构成独一无二的指纹。

引用此