摘要
We demonstrate a passively Q-switched and mode-locked (QML) laser with both YVO4/Nd:YVO4/Nd:YVO4 crystal and MoS2 saturable absorber (MoS2-SA) at ∼1342.5 nm. The MoS2-SA is fabricated with the liquid phase exfoliation (LPE) method. By inserting MoS2-SA into a Z-type resonator, we obtain a QML laser operation with the maximum average output power of 600 mW, the shortest envelope duration of 800 ns and the highest repetition rate of 98 kHz at 9 W. The energy of a Q-switched envelope is estimated to be about 6.12 μJ and the peak power is 39 W. The obtained envelope width and repetition rate are both superior to the results obtained from QML lasers with V3+:YAG and graphene at 1.34 μm. So far as we know, it is the first report on the QML laser at 1.34 μm with MoS2-SA, which proves the MoS2-SA is a good candidate for solid-state QML laser at 1.34 μm.
源语言 | 英语 |
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页(从-至) | 293-296 |
页数 | 4 |
期刊 | Optics and Laser Technology |
卷 | 109 |
DOI | |
出版状态 | 已出版 - 1月 2019 |
已对外发布 | 是 |