摘要
By using NH4F/H2O2 as the surface passivant for p-CZT crystals, the C-V characteristics of p-CZT wafers before and after passivation surface treatments are investigated comparatively. After the passivation treatment, TeO2 oxide layer with the thickness of about 3.1 nm is obtained on the surface of CZT wafer through XPS analysis. C-V test of CZT wafers is carried out by using Agilent 4294A Precision Impedance Analyzer with the frequency of 1 MHz. The results show that passivated CZT wafer has higher barrier height, i. e. , the barrier height of passivated CZT wafer is 1.512 V while that of non-passivated CZT wafer is 1.393 V.
源语言 | 英语 |
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页(从-至) | 306-308 |
页数 | 3 |
期刊 | Bandaoti Guangdian/Semiconductor Optoelectronics |
卷 | 27 |
期 | 3 |
出版状态 | 已出版 - 6月 2006 |