Influence of magnetron sputtering growth parameters on the microstructure and optical properties of ZnO films

Hua Wa Yu, Ya Li Du, Jing Wang, Jing Liu

科研成果: 期刊稿件文章同行评审

摘要

ZnO thin films with (002) orientation have been deposited on Si(100) substrate by radio frequency (RF) magnetron sputtering technique. The influence of RF power and oxygen ratio on the grain size, the residual stress and optical properties was investigated by X-ray diffraction and transmission spectra. The results show that the crystallization of the ZnO film deposited with sputtering power (100W) and oxygen ratio (60%), can obtain its best c-axis orientation and crystallization and tension stress of the film reaches the lowest.

源语言英语
页(从-至)181-185
页数5
期刊Fangzhi Gaoxiao Jichukexue Xuebao
20
2
出版状态已出版 - 6月 2007
已对外发布

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