Influence of magnetron sputtering growth parameters on the microstructure and optical properties of ZnO films

Hua Wa Yu; Ya Li Du; Jing Wang; Jing Liu

Influence of magnetron sputtering growth parameters on the microstructure and optical properties of ZnO films

Hua Wa Yu, Ya Li Du, Jing Wang, Jing Liu

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

ZnO thin films with (002) orientation have been deposited on Si(100) substrate by radio frequency (RF) magnetron sputtering technique. The influence of RF power and oxygen ratio on the grain size, the residual stress and optical properties was investigated by X-ray diffraction and transmission spectra. The results show that the crystallization of the ZnO film deposited with sputtering power (100W) and oxygen ratio (60%), can obtain its best c-axis orientation and crystallization and tension stress of the film reaches the lowest.

源语言	英语
页（从-至）	181-185
页数	5
期刊	Fangzhi Gaoxiao Jichukexue Xuebao
卷	20
期	2
出版状态	已出版 - 6月 2007
已对外发布	是

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title = "Influence of magnetron sputtering growth parameters on the microstructure and optical properties of ZnO films",

abstract = "ZnO thin films with (002) orientation have been deposited on Si(100) substrate by radio frequency (RF) magnetron sputtering technique. The influence of RF power and oxygen ratio on the grain size, the residual stress and optical properties was investigated by X-ray diffraction and transmission spectra. The results show that the crystallization of the ZnO film deposited with sputtering power (100W) and oxygen ratio (60%), can obtain its best c-axis orientation and crystallization and tension stress of the film reaches the lowest.",

keywords = "Crystallization, Magnetron sputtering, RF power, ZnO thin films",

author = "Yu, {Hua Wa} and Du, {Ya Li} and Jing Wang and Jing Liu",

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AU - Yu, Hua Wa

AU - Du, Ya Li

AU - Wang, Jing

AU - Liu, Jing

PY - 2007/6

Y1 - 2007/6

N2 - ZnO thin films with (002) orientation have been deposited on Si(100) substrate by radio frequency (RF) magnetron sputtering technique. The influence of RF power and oxygen ratio on the grain size, the residual stress and optical properties was investigated by X-ray diffraction and transmission spectra. The results show that the crystallization of the ZnO film deposited with sputtering power (100W) and oxygen ratio (60%), can obtain its best c-axis orientation and crystallization and tension stress of the film reaches the lowest.

AB - ZnO thin films with (002) orientation have been deposited on Si(100) substrate by radio frequency (RF) magnetron sputtering technique. The influence of RF power and oxygen ratio on the grain size, the residual stress and optical properties was investigated by X-ray diffraction and transmission spectra. The results show that the crystallization of the ZnO film deposited with sputtering power (100W) and oxygen ratio (60%), can obtain its best c-axis orientation and crystallization and tension stress of the film reaches the lowest.

KW - Crystallization

KW - Magnetron sputtering

KW - RF power

KW - ZnO thin films

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JO - Fangzhi Gaoxiao Jichukexue Xuebao

JF - Fangzhi Gaoxiao Jichukexue Xuebao

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ER -

Influence of magnetron sputtering growth parameters on the microstructure and optical properties of ZnO films

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