摘要
I-V characteristics of HgI2 crystal wafers with different contacting layers, such as sputtering Au, chloroauric acid decomposed Au, colloidal graphite, were studied using Aligent4155 CVIV instrument, and analyzed according to thermoionic emission model. The results indicate that the fitting data, b, according to I = aVb and representing ohmic contacts are 1.0291 and 0.9380, and the contact resistances are 3.0 × 108Ω and 1.0 × 108Ω for AuCl3 (Au)/HgI2 and C (graphite) /HgI2, respectively, while 0.8341 and 3.5 × 109Ω for sputtered Au. Heavily doped layer might be formed at HgI2 surface during decomposed process of AuCl2 which produced obvious tunnel current and idea ohmic contacts. Colloidal graphite had better chemical stability and craft of electrode fabrication did not deteriorate surface quality of HgI2 crystal wafers. Thus, C/HgI2 had lower contact resistance and better ohmic porperties. The higher temperature during sputtering of Au contacts leading to HgI2 volatilization deteriorated the interface quality of HgI2 crystal wafers, which formed no ohmic contacts.
源语言 | 英语 |
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页(从-至) | 1148-1151 |
页数 | 4 |
期刊 | Rengong Jingti Xuebao/Journal of Synthetic Crystals |
卷 | 37 |
期 | 5 |
出版状态 | 已出版 - 10月 2008 |