TY - JOUR
T1 - Growth and electrical properties of mercury indium telluride crystals
AU - Wang, Linghang
AU - Dong, Yangchun
AU - Jie, Wanqi
PY - 2007/7
Y1 - 2007/7
N2 - Hg3-3xIn2xTe3(MIT)(x=0.5) single crystals were successfully grown using the vertical Bridgman method (VB) and were investigated by XRD, RO-XRD, and Hall measurements. The results show that the as-grown crystal is high quality single-phase crystal. The wafer surface is (311) face, and the crystal face is located at θ=23.86°. The spatial deviation angle of the (311) face is φ=2.9°, and the degree of orientation scatter is FWHM=0.3°. The crystal is an n-type semiconductor. The resistivity, carrier concentration, and carrier mobility are 4.79 × 102Ω·cm, 2.83 × 1013 cm-3, and 4.6 × 102 cm2/(V·s), respectively. The Fermi level lies near the midgap and is about 8 meV higher. The, calculated values of the carrier concentration are in agreement with the experimental ones.
AB - Hg3-3xIn2xTe3(MIT)(x=0.5) single crystals were successfully grown using the vertical Bridgman method (VB) and were investigated by XRD, RO-XRD, and Hall measurements. The results show that the as-grown crystal is high quality single-phase crystal. The wafer surface is (311) face, and the crystal face is located at θ=23.86°. The spatial deviation angle of the (311) face is φ=2.9°, and the degree of orientation scatter is FWHM=0.3°. The crystal is an n-type semiconductor. The resistivity, carrier concentration, and carrier mobility are 4.79 × 102Ω·cm, 2.83 × 1013 cm-3, and 4.6 × 102 cm2/(V·s), respectively. The Fermi level lies near the midgap and is about 8 meV higher. The, calculated values of the carrier concentration are in agreement with the experimental ones.
KW - Crystal growth
KW - HgInTe
KW - NIR detector
KW - Photovoltaic semiconductors
KW - Vertical Bridgman method
UR - http://www.scopus.com/inward/record.url?scp=34547636907&partnerID=8YFLogxK
M3 - 文章
AN - SCOPUS:34547636907
SN - 0253-4177
VL - 28
SP - 1069
EP - 1071
JO - Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors
JF - Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors
IS - 7
ER -