TY - CHAP
T1 - Fabrication of zao ceramic target and effect on the photoelectric properties of its film
AU - Han, Meikang
AU - Yang, Jueming
AU - Yin, Xiaowei
AU - Li, Jianping
N1 - Publisher Copyright:
© 2014 by The American Ceramic Society. All rights reserved.
PY - 2014/1/1
Y1 - 2014/1/1
N2 - ZAO ceramic target was fabricated by cold isotatic pressing and pressureless sintering ZAO powder used method of homogeneous precipitation. Then, ZAO film was deposited by RF magnetron sputtering of the lab-made ZAO target. The microstructures and phases of ZAO target and its film were characterized by scanning electron microscopy (SEM), energy dispersion spectroscopy (EDS), and X-ray diffraction apparatus. Results show that the relative density of the target is above 93%, and there are the second phase ZnAl2O4 in ZnO crystal boundary. ZAO films with resistivity 1.083xl0-3 cm and visible light transmittance beyond 85% were obtained by the target.
AB - ZAO ceramic target was fabricated by cold isotatic pressing and pressureless sintering ZAO powder used method of homogeneous precipitation. Then, ZAO film was deposited by RF magnetron sputtering of the lab-made ZAO target. The microstructures and phases of ZAO target and its film were characterized by scanning electron microscopy (SEM), energy dispersion spectroscopy (EDS), and X-ray diffraction apparatus. Results show that the relative density of the target is above 93%, and there are the second phase ZnAl2O4 in ZnO crystal boundary. ZAO films with resistivity 1.083xl0-3 cm and visible light transmittance beyond 85% were obtained by the target.
KW - Cold isotatic pressing
KW - Pressureless sintering
KW - Scanning electron microscopy
KW - Transparent conductive oxide
KW - X-ray diffraction
UR - http://www.scopus.com/inward/record.url?scp=85101890694&partnerID=8YFLogxK
U2 - 10.1002/9781118932995.ch16
DO - 10.1002/9781118932995.ch16
M3 - 章节
AN - SCOPUS:85101890694
SN - 9781118932988
SP - 159
EP - 166
BT - High Temperature Ceramic Matrix Composites 8
PB - wiley
ER -