TY - JOUR
T1 - Etch pits observation and in distribution in mercury indium telluride single crystals
AU - Wang, Linghang
AU - Jie, Wanqi
AU - Yang, Yang
AU - Xu, Gang
AU - Fu, Li
PY - 2008/5/1
Y1 - 2008/5/1
N2 - Mercury indium telluride (MIT) crystal, Hg(3-3x)In 2xTe3 (x = 0.5), is one of the most promising novel materials for room temperature near-infrared photodetectors. By the vertical Bridgman method, several MIT ingots were grown. An etchant for displaying the etch pits was developed. The etch pits of dislocations and boundary were observed. It was found that the etch pits were in the shape of the isosceles triangle, and the etch pits' density of dislocations was about 4 × 10 5 cm-2. The characteristics of In in MIT ingots were studied. The composition distributions reveal that the segregation coefficient of In in MIT is 1.15. Te and In reduced at the grain boundary, while they were homogeneous within the grains. I-V measurements show that In/MIT contact was a good Ohmic contact. The resistivity of the measured MIT wafers was about 238 Ω cm.
AB - Mercury indium telluride (MIT) crystal, Hg(3-3x)In 2xTe3 (x = 0.5), is one of the most promising novel materials for room temperature near-infrared photodetectors. By the vertical Bridgman method, several MIT ingots were grown. An etchant for displaying the etch pits was developed. The etch pits of dislocations and boundary were observed. It was found that the etch pits were in the shape of the isosceles triangle, and the etch pits' density of dislocations was about 4 × 10 5 cm-2. The characteristics of In in MIT ingots were studied. The composition distributions reveal that the segregation coefficient of In in MIT is 1.15. Te and In reduced at the grain boundary, while they were homogeneous within the grains. I-V measurements show that In/MIT contact was a good Ohmic contact. The resistivity of the measured MIT wafers was about 238 Ω cm.
UR - http://www.scopus.com/inward/record.url?scp=43149106193&partnerID=8YFLogxK
U2 - 10.1088/0268-1242/23/5/055015
DO - 10.1088/0268-1242/23/5/055015
M3 - 文章
AN - SCOPUS:43149106193
SN - 0268-1242
VL - 23
JO - Semiconductor Science and Technology
JF - Semiconductor Science and Technology
IS - 5
M1 - 055015
ER -