TY - JOUR
T1 - Deposition mechanism and characterizations of CuInS2 film prepared by one-step electro-deposition
AU - Li, Libo
AU - Gao, Guanxiong
AU - Li, Qi
AU - Ma, Yue
AU - You, Jun
AU - Liu, Changfa
AU - Wang, Heng
N1 - Publisher Copyright:
© 2015, Springer Science+Business Media New York.
PY - 2016/2/1
Y1 - 2016/2/1
N2 - CuInS2 films had been prepared on FTO using a one-step deposition method, with sodium citrate complexing agent. The film was deposited from the solution containing 20 mmol L−1 CuSO4, 7.5 mmol L−1 In2S3O12, 75 mmol L−1 Na2S2O3 and 8.5 mmol L−1 Na3C6H5O7 for 1200 s. The films were characterized by the UV–visible absorption spectroscopy, SEM, AFM, XRD, XPS methods. By the cyclic voltammetry curves of Cu, S, Cu–S, In, In–S, Cu–In–S, the mechanism of CuInS2 deposition was gotten, that is, the reduction reaction of Cu and In occured, and then S was under potential deposition.
AB - CuInS2 films had been prepared on FTO using a one-step deposition method, with sodium citrate complexing agent. The film was deposited from the solution containing 20 mmol L−1 CuSO4, 7.5 mmol L−1 In2S3O12, 75 mmol L−1 Na2S2O3 and 8.5 mmol L−1 Na3C6H5O7 for 1200 s. The films were characterized by the UV–visible absorption spectroscopy, SEM, AFM, XRD, XPS methods. By the cyclic voltammetry curves of Cu, S, Cu–S, In, In–S, Cu–In–S, the mechanism of CuInS2 deposition was gotten, that is, the reduction reaction of Cu and In occured, and then S was under potential deposition.
UR - http://www.scopus.com/inward/record.url?scp=84956634764&partnerID=8YFLogxK
U2 - 10.1007/s10854-015-3998-8
DO - 10.1007/s10854-015-3998-8
M3 - 文章
AN - SCOPUS:84956634764
SN - 0957-4522
VL - 27
SP - 2108
EP - 2113
JO - Journal of Materials Science: Materials in Electronics
JF - Journal of Materials Science: Materials in Electronics
IS - 2
ER -