摘要
HfC-SiC modified C/C composites containing in situ formed Si-HfC-HfSi2 ablation resistant layer and SiC oxidation resistant layer were successfully prepared by reactive melt infiltration (RMI) combined with gaseous silicon infiltration (GSI). A comparative study was conducted on the anti-oxidation and anti-ablation performance of the C/C-HfC-SiC composites with GSI (noted as RG-CHS) and without GSI (noted as R-CHS). After oxidation at 1,500 °C for 200 min, the oxide film of RG-CHS remained intact. The mass and linear ablation rates decreased from 1.31 mg/s and 7.36 μm/s to 0.12 mg/s and −0.22 μm/s after GSI process, respectively. The introduction of low melting point phases and reducing surface defects can improve the high temperature oxidation resistance and plasma ablation resistance of the composites.
源语言 | 英语 |
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文章编号 | 100846 |
期刊 | Journal of Materiomics |
卷 | 11 |
期 | 1 |
DOI | |
出版状态 | 已出版 - 1月 2025 |