TY - JOUR
T1 - Ambipolar organic heterojunction transistors based on F16CuPc/CuPc with a MoO3 buffer layer
AU - Yi, Mingdong
AU - Zhang, Ning
AU - Xie, Linghai
AU - Huang, Wei
N1 - Publisher Copyright:
© 2015 Chinese Institute of Electronics.
PY - 2015/10
Y1 - 2015/10
N2 - We fabricated heterojunction organic field-effect transistors (OFETs) using copper phthalocyanine (CuPc) and hexadecafluorophtholocyaninatocopper (F16CuPc) as hole transport layer and electron transport layer, respectively. Compared with F16CuPc based OFETs, the electron field-effect mobility in the heterojunction OFETs increased from 3.1 × 10-3 to 8.7 × 10-3 cm2/(V•s), but the p-type behavior was not observed. To enhanced the hole injection, we modified the source-drain electrodes using the MoO3 buffer layer, and the hole injection can be effectively improved. Eventually, the ambipolar transport characteristics of the CuPc/F16CuPc based OFETs with a MoO3 buffer layer were achieved, and the field-effect mobilities of electron and hole were 2.5 × 10-3 and 3.1 × 10-3 cm2/(V•s), respectively.
AB - We fabricated heterojunction organic field-effect transistors (OFETs) using copper phthalocyanine (CuPc) and hexadecafluorophtholocyaninatocopper (F16CuPc) as hole transport layer and electron transport layer, respectively. Compared with F16CuPc based OFETs, the electron field-effect mobility in the heterojunction OFETs increased from 3.1 × 10-3 to 8.7 × 10-3 cm2/(V•s), but the p-type behavior was not observed. To enhanced the hole injection, we modified the source-drain electrodes using the MoO3 buffer layer, and the hole injection can be effectively improved. Eventually, the ambipolar transport characteristics of the CuPc/F16CuPc based OFETs with a MoO3 buffer layer were achieved, and the field-effect mobilities of electron and hole were 2.5 × 10-3 and 3.1 × 10-3 cm2/(V•s), respectively.
KW - ambipolar
KW - contact resistance
KW - heterojunction
KW - organic field-effect transistors
UR - http://www.scopus.com/inward/record.url?scp=84947225200&partnerID=8YFLogxK
U2 - 10.1088/1674-4926/36/10/104001
DO - 10.1088/1674-4926/36/10/104001
M3 - 文章
AN - SCOPUS:84947225200
SN - 1674-4926
VL - 36
JO - Journal of Semiconductors
JF - Journal of Semiconductors
IS - 10
M1 - 104001
ER -