Wide-temperature range oxidation-ablation resistance of vacuum hot-pressed NbC-modified HfC ultra-high temperature ceramics

Ruixiang He, Kezhi Li, Mengyuan Chang

Research output: Contribution to journalArticlepeer-review

Abstract

The static-oxidation behaviour at 1700 °C and ablation resistance under an oxyacetylene flame of vacuum hot-pressed NbC-modified HfC (Hf1-xNbxC) ultra-high temperature ceramics were investigated. Additionally, the phase compositions of HfO2[sbnd]Nb2O5 ceramics heat-treated in Ar were analysed to systematically explain the oxidation-ablation mechanism of Hf1-xNbxC. The results indicated that the stable phases of HfO2-50 mol% NbO2.5 ceramics heat-treated at 1700[sbnd]1900 °C were Nb2Hf6O17 and NbO2. The antioxidant temperature limit for Hf1-xNbxC was ≥ 1700 °C. At 1700 °C for 30 h, Hf0.8Nb0.2C formed a dense oxide film comprising bulky HfO2 bonded by lathy Nb2Hf8O21, which exhibited the best anti-oxidation property. Furthermore, Hf0.9Nb0.1C developed a dense “free-standing” single-phase HfO2 film under an oxyacetylene flame at 4.2 MW/m2 for 40 s × 3, demonstrating excellent high-temperature ablation resistance. The formation-decomposition mechanism of Nb2Hf6O17 and the effects of NbC on the morphology and size of HfO2 grains under an oxyacetylene flame at 2.4 MW/m2 were examined.

Original languageEnglish
Article number180041
JournalJournal of Alloys and Compounds
Volume1022
DOIs
StatePublished - 10 Apr 2025

Keywords

  • Film-formation mechanism
  • NbHfC ultra-high temperature ceramics
  • Oxidation-ablation resistance
  • Thermal stability
  • Vacuum hot-pressed sintering

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