Uniform design and regression analysis of LPCVD boron carbide from BCl 3 -CH 4 -H 2 system

Yongsheng Liu, Litong Zhang, Laifei Cheng, Qingfeng Zeng, Weihua Zhang, Wenbin Yang, Zude Feng, Siwei Li, Bin Zeng

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23 Scopus citations

Abstract

Boron carbide was prepared by low pressure chemical vapor deposition (LPCVD) from BCl 3 -CH 4 -H 2 system. The deposition process conditions were optimized through using a uniform design method and regression analysis. The regression model of the deposition rate was established. The influences of deposition temperature (T), deposition time (t), inlet BCl 3 /CH 4 gas ratio (δ), and inlet H 2 /CH 4 gas ratio (θ) on deposition rate and microstructure of the coatings were investigated. The optimized deposition parameters were obtained theoretically. The morphologies, phases, microstructure and composition of deposits were characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman micro-spectroscopy, transmission electron microscopy (TEM), energy dispersive spectra (EDS), and Auger electron spectra (AES), the results showed that different boron carbides were produced by three kinds of deposition mechanisms. Crown

Original languageEnglish
Pages (from-to)5729-5735
Number of pages7
JournalApplied Surface Science
Volume255
Issue number11
DOIs
StatePublished - 15 Mar 2009

Keywords

  • Boron carbide
  • CVD
  • Deposition mechanisms
  • Microstructure
  • Uniform design

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